&#8226; &nbsp; Load locked cluster tool<br />
&#8226; &nbsp; Cassette to cassette processing<br />
&#8226; &nbsp; Up to 4 coatings can be deposited without breaking vacuum<br />
&#8226; &nbsp; Substrate sizes: 125 x 125mm,156 x 156mm and 200mm dia.<br />
&nbsp;&nbsp;&nbsp; (smaller sizes can be processed using a carrier)<br />
&#8226; &nbsp; Typical coatings: SiOx &amp; SiNx - doped &amp; undoped &amp; a- Si<br />
&#8226; &nbsp; R&amp;D, Pilot production and production capabilities<br />
&#8226; &nbsp; RIE chambers available<br />
&#8226; &nbsp; Full computer control<br />
&#8226; &nbsp; Process chamber is modular and interfaced with 200mm slot valve